Modular thin-film systems: CVD and ALD technologies for high-performance barrier coatings
CVD, PE-CVD and ALD/CVD deposition systems: Coating systems for production or research in the field of barrier coatings. Low-temperature processes, specially developed for parylene and ceramic thin films.
CVD, PE-CVD and ALD deposition systems for the production of high quality barrier coatings. Available in three standard sizes (CX-30, CX-300 and CX600), the reactor can be customized to intermediate or larger size to match the actual productivity requirements. The systems are fully automated with a data logging of every process parameters.
- CVD machines can process all parylene grades (N, C, F, AF4)
- PE-CVD allows the production of low temperature defect-free ceramic films
- ALD combined with CVD produce best in class barrier coatings with ultra low permeation rate
Together with the machine , we propose training, maintenance and . service plans for a stable and reliable operation of the equipment.
All raw materials (parylene dimers and ceramic chemical precursors) can be purchased from COAT-X.
